Measuring the field strength on the absorber can help us understand how the absorber polarizes to achieve ultra-wideband absorption and obtain high thermal radiation intensity [
47,
48]. Under different bands, we selected five wavelengths that perform better in absorption for field strength analysis. Figures
2(a) and
(b) are the electric field intensity distribution maps of XOY plane and XOZ plane with near-ultraviolet wavelength
λ1 = 355.5 nm. It can be clearly seen from the observation results that the outer surface of TiN nanoplates and Si
3N
4 thin films exhibit strong surface plasmon resonance. Figure
2(b) shows that the electromagnetic field is also observed in the outer region of the absorber, indicating that the plasma array excites the lattice resonance in a period of 500 nm. In figures
2(c) and
(d), under the incident of visible light
λ2 = 504 nm, the outer surface of the first layer of TiN nanodisks accumulates a high-intensity electric field, and there is also obvious strong coupling between adjacent disks. This is because the gap between the disks can be regarded as a cavity [
49,
50]. After the incident light enters, the cavity membrane resonance is generated between the cavities. The generation of cavity mode resonance makes the energy bound between the disk gaps and the interaction between the cavities is strengthened. Figures
2(c) and
(f) corresponds to the case of visible light wavelength
λ3 = 633 nm, the strong effect occurs on the corner surface of TiN disk. Figure
2(g)–(j) are near-infrared light at 1048 nm and 1324 nm, respectively. There is a strong electric field on the corner surface of the third TiN nanodisk. Beyond the infrared wavelength range, the elongation of optical wavelengths results in an expansion of the resonant area for the third layer of TiN nanodisks and an augmentation of resonance between neighboring disks. Through the observation of these wavelengths, we can know that the reason why the absorber achieves ultra-wideband perfect absorption is that the structure has a strong effect on the near-field coupling of the structure [
51].